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Applied Physics LettersVolume 83, Issue 8, 25 August 2003, Pages 1629-1631

Three-dimensional nanolithography using proton beam writing(Article)

  • Centre for Ion Beam Applications, Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117542, Singapore

Abstract

Three-dimensional nanolithography was investigated using proton beam writing. When the proton beam interacts with matter it follows an almost straight path. It was observed that the secondary electrons induced by the primary proton beams have low energy and therefore limited range, resulting in minimal proximity effects.

Indexed keywords

Engineering controlled terms:Aspect ratioMonte Carlo methodsProton beams
Engineering uncontrolled terms:Proton beam writing
Engineering main heading:Nanotechnology
  • ISSN: 00036951
  • CODEN: APPLA
  • Source Type: Journal
  • Original language: English
  • DOI: 10.1063/1.1604468
  • Document Type: Article

  Van Kan, J.A.; Centre for Ion Beam Applications, Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore;
© Copyright 2008 Elsevier B.V., All rights reserved.

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