

This article reports a new approach for probe manufacturing, which is the key component in scanning near-field optical microscope (SNOM). The wet-etching process, to create the tip at the apex of a tapered fiber, has been optimized. Typical tip features are short tapers, large cone angles (30°), and very small diameters (<50 nm). Next process steps are performed in an original arrangement of plasma device, based on a modified hollow cathode discharge. It is used for both, to remove the dust particles or the etching residues from the tip surface and to coat the tapered region with a metallic ultrathin and compact film. To complete the probe's fabrication, the tips are opened by dry electrolytic erosion. These probes have been successfully tested for SNOM applications. © 2006 American Institute of Physics.
| Engineering controlled terms: | CathodesEtchingNear field scanning optical microscopyPlasma devicesProbesSputtering |
|---|---|
| Engineering uncontrolled terms: | Cathode dischargesCathode sputteringEtching residuesWet-etching processes |
| Engineering main heading: | Nanotechnology |
Chaigneau, M.; Institut des Mat́riaux Jean Rouxel, UMR 6502, CNRS-Universit́ de Nantes, BP 32229, France
© Copyright 2008 Elsevier B.V., All rights reserved.