Scopus will soon cease the support of IE 9 and users are recommended to upgrade to the latest Internet Explorer, Firefox, or Chrome.


The AuAl2 intermetallic compounds are of substantial interest in view of their application potential. The investigated intermetallics AuAl 2+6%Cu were prepared from fine powders of AuAl2 and Cu by vacuum sputtering on a glass substrate and consisted of films with a thickness of about one micrometer. The films were annealed. The temperature and field dependence of the electroresistivity, the magnetoresistivity and the Hall effect of AuAl2+6%Cu films were measured in the temperature interval from 4.2 to 100 K and at magnetic fields of up to 15 T. We demonstrate that the temperature dependence of the electroresistivity has a minimum at T = 20 K and a metallic behavior above this temperature. The magnetoresistivity is very small (less then 1%), positive at low temperatures and negative above 12 K. The Hall coefficient is positive, which corresponds to the holes in a one zone model with a charge carrier concentration of about 1.6 1020 cm-3. © Published under licence by IOP Publishing Ltd.
| Engineering controlled terms: | Carrier concentrationCondensed matter physicsCopper compoundsIntermetallicsLow temperature effectsQuantum chemistryQuantum electronicsSubstratesTemperatureTemperature distributionThickness measurement |
|---|---|
| Engineering uncontrolled terms | Field dependenceGalvanomagnetic propertiesHall coefficientLow temperaturesMetallic behaviorsTemperature dependenceTemperature intervalsVacuum sputtering |
| Engineering main heading: | Copper |
Marchenkov, V.V.; Institute of Metal Physics, Russian Federation;
© Copyright 2018 Elsevier B.V., All rights reserved.