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Journal of Physics: Conference SeriesVolume 1115, Issue 2, 27 November 2018, Article number 0220216th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018; Tomsk; Russian Federation; 16 September 2018 through 22 September 2018; Code 142762

Study of process of avalanche switching of silicon thyristors without bias voltage(Conference Paper)(Open Access)

  • Perminova, O.E.,
  • Tsyranov, S.N.
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  • aUral Federal University, 19 Mira Street, Yekaterinburg, 620002, Russian Federation
  • bInstitute of Electrophysics, 106 Amundsen Street, Yekaterinburg, 620016, Russian Federation

Abstract

Operation of the high-power thyristor without bias voltage switching in the impact-ionization mode was studied by numerical simulation methods. In calculations, the rate of voltage build-up on the dV/dt structure varied from 0.5 to 10 kV/ns, the temperature of the T structure was from 25 to 200 °C. It is shown that the increase in temperature affects the process of switching thyristors both due to an increase in the rate of thermal generation of carriers, and due to a decrease in the intensity of impact ionization processes. During switching processes of impact ionization occur at the same time in two regions of n-base: in the part of a base filled with the majority carriers and in the space charge region (SCR) near the n-p junction. At T>180 °C, owing to increase in concentration of thermo-generated carriers in the base, ionization processes occur only in SCR. It leads to increase in duration of switching process and increase in residual voltage. However, despite it if dV/dt>9 kV/ns, the effect of fast switching of the thyristor exists up to 200 °C. © Published under licence by IOP Publishing Ltd.

Indexed keywords

Engineering controlled terms:Bias voltageNumerical methodsRadiation effectsSiliconSwitchingThyristors
Engineering uncontrolled termsIonization processMajority carriersNumerical simulation methodSilicon thyristorsSpace charge regionsSwitching processThermal generationVoltage switching
Engineering main heading:Impact ionization

Funding details

Funding sponsor Funding number Acronym
Russian Foundation for Basic Research17-08-00203,17-08-00406,18-08-01390RFBR
Russian Academy of SciencesRAS
  • 1

    The study was supported by Russian Foundation for Basic Research (RFBR), research projects No. 17-08-00203 and 17-08-00406 and 18-08-01390, and by RAS Program Project No. 10. The authors express their sincere appreciation to Rukin S. N., Gusev A.I., Lyubutin S.K. and Slovikovsky B.G. for experimental data.

  • ISSN: 17426588
  • Source Type: Conference Proceeding
  • Original language: English
  • DOI: 10.1088/1742-6596/1115/2/022021
  • Document Type: Conference Paper
  • Volume Editors: Vorobyov M.,Sorokin D.
  • Publisher: Institute of Physics Publishing


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