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Journal of Applied PhysicsVolume 78, Issue 9, 1995, Pages 5750-5755

Photoacoustic frequency heat-transmission technique: Thermal and carrier transport parameters measurements in silicon(Article)(Open Access)

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  • aCenter for Multidisciplinary Studies, University of Belgrade, P.O. Box 373, 11000 Belgrade, Serbia
  • bJoint Laboratory for Advanced Materials of SASA, P.O. Box 366, 11000 Belgrade, Serbia
  • cFaculty of Electrical Engineering, University of Belgrade, P.O. Box 816, 11000 Belgrade, Serbia

Abstract

Photoacoustic frequency heat-transmission technique is used to study thermal and carrier transport properties in low-doped silicon wafers. Amplitude and phase photoacoustic signals as a function of modulation frequency of incident optical beam are measured using different experimental conditions. The thermal diffusivity, coefficient of excess carrier diffusion, carrier lifetime, and the surface recombination velocity were determined by comparing experimental results and calculated theoretical photoacoustic signals. The suitability of the photoacoustic frequency heat-transmission technique as a contactless diagnostic method is assessed in comparison with the more conventional photothermal deflection and photothermal modulated reflection techniques. © 1995 American Institute of Physics.

  • ISSN: 00218979
  • Source Type: Journal
  • Original language: English
  • DOI: 10.1063/1.359637
  • Document Type: Article

  Todorović, D.M.; Center for Multidisciplinary Studies, University of Belgrade, P.O. Box 373, Serbia
© Copyright 2024 Elsevier B.V., All rights reserved.

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