A consideration of transparent metal structures for subwavelength diffraction management(Conference Paper)
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- aIHTM, Institute of Microelectronic Technologies and Single Crystals, Njegoševa 12, 11000 Belgrade, Serbia
- bIHTM, Institute of Catalysis and Chemical Engineering, Njegoševa 12, 11000 Belgrade, Serbia
- cDepartment of Applied Mathematics, University of Twente, Netherlands
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Abstract
We considered theoretically and experimentally one-dimensional multilayered metallodielectric nanofilms with nanometric thickness for imaging below the diffraction limit. We investigated their behavior in the ultravioled and visible spectrum from the point of view of near field optics, but also considered some of their properties in the far field. We designed our structures using the transfer matrix method and utilized RF sputtering to fabricate them. We consider some possible approaches to extract optical information from such multilayers. © 2006 IEEE.
Indexed keywords
| Engineering controlled terms: | DiffractionMicroelectronicsNear field scanning optical microscopyOptical multilayers |
|---|---|
| Engineering uncontrolled terms | Diffraction limitsDiffraction managementMetallodielectricNear field opticsOptical informationSub-wavelengthTransparent metalsVisible spectra |
| Engineering main heading: | Transfer matrix method |
- ISBN: 1424401178;978-142440117-8
- Source Type: Conference Proceeding
- Original language: English
- DOI: 10.1109/ICMEL.2006.1650917
- Document Type: Conference Paper
- Sponsors: IEEE Electron Devices Society
- Publisher: IEEE Computer Society
Jakšić, Z.; IHTM, Institute of Microelectronic Technologies and Single Crystals, Njegoševa 12, Serbia;
© Copyright 2020 Elsevier B.V., All rights reserved.
Cited by 1 document
Sarajlić, M.
, Jakšić, Z.
, Jovanović, D.
(2008) "2008 26th International Conference on Microelectronics, Proceedings, MIEL 2008"
(2008) "2008 26th International Conference on Microelectronics, Proceedings, MIEL 2008"
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