

In this paper, we present the results of a study of TiN thin films which are deposited by a Physical Vapour Deposition (PVD) and Ion Beam Assisted Deposition (IBAD). In the present investigation the subsequent ion implantation was provided with N2+ ions. The ion implantation was applied to enhance the mechanical properties of surface. The thin film deposition process exerts a number of effects such as crystallographic orientation, morphology, topography, densification of the films.. A variety of analytic techniques were used for characterization, such as scratch test, calo test, Scanning electron microscopy (SEM), Atomic Force Microscope (AFM), X-ray diffraction (XRD) and Energy Dispersive X-ray analysis (EDAX). © (2012) Trans Tech Publications, Switzerland.
| Engineering uncontrolled terms | Analytic techniqueAtomic force microscope (AFM)Crystallographic orientationsEnergy dispersive x-rayPhysical vapour depositionScanning electron microscopies (SEM)Scratch testSuper hardThin-film depositionsTiN thin films |
|---|---|
| Engineering controlled terms: | Atomic force microscopyCoatingsHard coatingsMechanical propertiesNanohardnessScanning electron microscopySteelTitanium nitrideTopographyX ray diffraction |
| Engineering main heading: | Ion implantation |
Škorić, B.; University of Novi Sad, Faculty for Technical Sciences, Trg D.Obradovića 6, Serbia;
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