Detailed phisyco-chemical characterization of the multilayered thin films based on titanium oxynitride and copper doped titanium nitride obtained by different PVD techniques(Article)
- aVinča Institute of Nuclear Sciences - National Institute of thе Republic of Serbia, University of Belgrade, Mike Petrovića Alasa 12-14, Belgrade, 11001, Serbia
- bALBOS d.o.o., Orahovačka 19, Belgrade, 11000, Serbia
- cCEFITEC, Departamento de Física, Faculdade de Ciências e Tecnologia, Universidade Nova de Lisboa, Portugal
- dENEA, Laboratory of Innovative Devices (DTE-FSD-DIN), Piazzale Enrico Fermi 1, Portici, (NA) 80055, Italy
- eSGL Carbon, Weisbaden, Germany
- fFaculty of Dental Medicine, University of Belgrade, Dr Subotića 4, Belgrade, 11000, Serbia
- gInstitute of Physics, Faculty for Natural Sciences and Mathematics, St. Cyril and Methodius University, Arhimedova 3, Skopje, 1000, North Macedonia
- hPlasma Doo, 29 November 66/9, Skopje, 1000, North Macedonia
Abstract
Thin films on the base of titanium oxynitrides and copper doped titanium nitride were obtained by a combination of different PVD techniques on the surface of glass substrate and their physicochemical properties were analyzed in details. Phase composition of the samples was analyzed by XRD and FTIR methods, while microstructure of the samples was analyzed by SEM. XPS was used for depth profiling of the samples, which enabled determination of the oxidative state of titanium and corresponding phases through various film layers from the surface to the substrate. The depth of the various layers and their extinction coefficients and refractory indexes were estimated by spectroscopic ellipsometry. © 2021 Elsevier Ltd
Indexed keywords
| Engineering controlled terms: | Copper compoundsDepth profilingPhysicochemical propertiesSpectroscopic ellipsometrySubstratesThin filmsTitanium nitrideX ray diffraction |
|---|---|
| Engineering uncontrolled terms | Chemical characterizationFTIRGlass substratesMultilayered thin filmsPhysicochemical propertyThin-filmsTitaniaTitanium oxynitrideTitanium thin filmsXRD |
| Engineering main heading: | X ray photoelectron spectroscopy |
Funding details
| Funding sponsor | Funding number | Acronym |
|---|---|---|
| 45005,0402108,III45005,172026and III45005,172026 | ||
| UID/FIS/00068/2019 |
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1
This study was supported by the Ministry of Education, Science and Technological Development of the Republic of Serbia (Projects No. 172026 and III45005 and Theme 0402108 ), as well as by the Portuguese National Funding Agency for Science, Research and Technology in the framework of the project UID/FIS/00068/2019 .
- ISSN: 0042207X
- CODEN: VACUA
- Source Type: Journal
- Original language: English
- DOI: 10.1016/j.vacuum.2021.110708
- Document Type: Article
- Publisher: Elsevier Ltd
Jokanović, V.; Vinča Institute of Nuclear Sciences, Mike Petrovića Alasa 12-14, Belgrade, Serbia;
© Copyright 2021 Elsevier B.V., All rights reserved.
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